发明授权
US5625007A Process for making low optical polymers and copolymers for photoresists
and optical applications
失效
制备用于光致抗蚀剂和光学应用的低光学聚合物和共聚物的方法
- 专利标题: Process for making low optical polymers and copolymers for photoresists and optical applications
- 专利标题(中): 制备用于光致抗蚀剂和光学应用的低光学聚合物和共聚物的方法
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申请号: US295362申请日: 1994-08-24
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公开(公告)号: US5625007A公开(公告)日: 1997-04-29
- 发明人: Michael T. Sheehan , James H. Rea
- 申请人: Michael T. Sheehan , James H. Rea
- 申请人地址: NJ Somerville
- 专利权人: Hoechst Celanese Corp.
- 当前专利权人: Hoechst Celanese Corp.
- 当前专利权人地址: NJ Somerville
- 主分类号: C08F8/12
- IPC分类号: C08F8/12 ; C08F8/14
摘要:
The present invention pertains to polymers comprising poly(4-hydroxystyrene) or substituted poly(4-hydroxystyrene) or both. The polymers have low optical density (absorbance) over a wavelength range from about 240 to about 260 nm, as well as low optical density over the near UV and visible spectrum (310 to 800 nm). Such polymers are produced by polymerizing 4-acetoxystyrene and/or substituted 4-acetoxystyrene monomers, with or without other comonomers, and subsequently performing transesterification. In the most preferred embodiment of the present invention, the polymers are produced using at least one alcohol as a reaction medium, a chain transfer agent and a transesterification reactant, providing an unusually economic process. These polymers are particularly useful as photoresist components for use in combination with deep UV, X-ray, and E-Beam imaging systems.
公开/授权文献
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