发明授权
US5627020A Doped fine grain silver halide grains as a means of incorporating metal
dopant in emulsion finishing
失效
掺杂的细晶粒卤化银颗粒作为在乳液整理中掺入金属掺杂剂的手段
- 专利标题： Doped fine grain silver halide grains as a means of incorporating metal dopant in emulsion finishing
- 专利标题（中）： 掺杂的细晶粒卤化银颗粒作为在乳液整理中掺入金属掺杂剂的手段
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申请号： US584503申请日： 1996-01-11
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公开(公告)号： US5627020A公开(公告)日： 1997-05-06
- 发明人: Paul T. Hahm , Walter H. Isaac
- 申请人： Paul T. Hahm , Walter H. Isaac
- 申请人地址： NY Rochester
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： NY Rochester
- 主分类号： G03C1/015
- IPC分类号： G03C1/015 ; G03C1/035 ; G03C1/07 ; G03C1/09
摘要：
The invention is directed to a method of forming a sensitized high chloride silver halide emulsion comprising providing a high chloride emulsion bringing a Lippmann emulsion comprising fine grains of silver bromide doped with metal into contact with said emulsion at a temperature of above 50.degree. C. wherein said metal is present in an amount between 0.001 and 0.25 mg/silver mole, said bromide is present in an amount between 0.05 and 3.0 mole percent bromide and the relationship of bromide and metal dopant isM percent Br=Xe.sup.-(Y.multidot.Mt),X=1.36.+-.0.65,Y=10.+-.5,Mt=metal.