发明授权
- 专利标题: Double-epitaxy heterojunction bipolar transistors for high speed performance
- 专利标题(中): 双外延异质结双极晶体管用于高速性能
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申请号: US227148申请日: 1994-04-13
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公开(公告)号: US5648666A公开(公告)日: 1997-07-15
- 发明人: Liem Thanh Tran , Dwight Christopher Streit , Aaron Kenji Oki
- 申请人: Liem Thanh Tran , Dwight Christopher Streit , Aaron Kenji Oki
- 申请人地址: CA Redondo Beach
- 专利权人: TRW Inc.
- 当前专利权人: TRW Inc.
- 当前专利权人地址: CA Redondo Beach
- 主分类号: H01L29/73
- IPC分类号: H01L29/73 ; H01L21/203 ; H01L21/331 ; H01L29/205 ; H01L29/737 ; H01L29/70
摘要:
This invention discloses a heterojunction bipolar transistor (HBT) which includes a relatively thin intrinsic collector region and a relatively thick extrinsic collector region such that collector-base capacitance is reduced and electron transit time is maintained. The fabrication of the HBT includes loading a semi-insulating substrate into an molecular beam epitaxy machine, and growing a sub-collector contact layer, a bottom collector layer and a top collector layer on the substrate. Next, the substrate is removed from the molecular beam epitaxy machine and the top collector layer is etched by a photolithographic process to produce separate intrinsic and extrinsic collector regions. Then, the substrate is again loaded into the molecular beam epitaxy machine so that the base and emitter layers can be grown. And finally, the emitter layer is etched to form an emitter mesa only over the intrinsic semiconductor region.
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