发明授权
US5652082A Photosensitive bis(halomethyloxadiazole) compound and photosensitive
transfer sheet using the same
失效
感光双(卤代甲基恶二唑)化合物和使用其的感光转印片
- 专利标题: Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same
- 专利标题(中): 感光双(卤代甲基恶二唑)化合物和使用其的感光转印片
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申请号: US703090申请日: 1996-08-26
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公开(公告)号: US5652082A公开(公告)日: 1997-07-29
- 发明人: Masatoshi Yumoto , Naoto Yanagihara , Ken Iwakura , Juniti Fujimori , Shinji Fujimoto , Minoru Maeda
- 申请人: Masatoshi Yumoto , Naoto Yanagihara , Ken Iwakura , Juniti Fujimori , Shinji Fujimoto , Minoru Maeda
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX6-212794 19940906; JPX6-227984 19940922; JPX7-38743 19950227; JPX7-40261 19950228
- 主分类号: C07D271/10
- IPC分类号: C07D271/10 ; G03F7/029 ; F23Q1/02
摘要:
Photosensitive bis(halomethyloxadiazole) compounds which are capable of producing free radicals upon exposure to light represented by the following general formulae (1) to (4): ##STR1## The symbols in the above formulae are defined in the present specification. The photosensitive bis(halomethyloxadiazole) compound is useful in the fields of recording materials such as photosensitive protecting films, printing plates, photoresists, proofs, etc. Furthermore, a photosensitive transfer sheet using a photosensitive composition containing the photosensitive bis(halomethyloxadiazole) is useful in making a prepress proof for color proofing, a color display, etc.
公开/授权文献
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