发明授权
- 专利标题: Method of producing substrate for ink jet recording head, ink jet recording head and ink jet recording apparatus
- 专利标题(中): 喷墨记录头用基板的制造方法,喷墨记录头及喷墨记录装置
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申请号: US517692申请日: 1995-08-22
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公开(公告)号: US5660739A公开(公告)日: 1997-08-26
- 发明人: Teruo Ozaki , Masami Ikeda , Masami Kasamoto , Toshihiro Mori , Masahiko Tonogaki , Yuji Kamiyama
- 申请人: Teruo Ozaki , Masami Ikeda , Masami Kasamoto , Toshihiro Mori , Masahiko Tonogaki , Yuji Kamiyama
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX6-201644 19940826
- 主分类号: B41J2/16
- IPC分类号: B41J2/16 ; B41J2/05
摘要:
A method for producing a substrate for an ink jet recording head comprises preparing a substrate with plural heat generating resistors for applying heat to the ink, plural wirings electrically connected thereto, and plural heat generating areas formed by the heat generating resistors exposed from the wirings, coating the heat generating resistors and the wirings on the substrate with a first insulating protective film, removing the first insulating protective film by wet etching in portions on the heat generating areas, and coating thus etched first insulating protective film with a second insulating protective film, wherein the etched portion of the first insulating protective film, in the longitudinal direction of the heat generating area, is positioned inside from the end of the heat generating area, by at least 1/2 of the thickness of the first and second insulating protective films covering the wirings.The protective film is thus made thinner on the heat generating areas, thus reducing the electric power consumption while maintaining sufficient durability.
公开/授权文献
- US5220169A Surface analyzing method and apparatus 公开/授权日:1993-06-15
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