发明授权
- 专利标题： Defect inspection method and apparatus, and defect display method
- 专利标题（中）： 缺陷检查方法和设备，缺陷显示方法
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申请号： US318551申请日： 1994-10-05
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公开(公告)号： US5663569A公开(公告)日： 1997-09-02
- 发明人: Fuminori Hayano
- 申请人： Fuminori Hayano
- 申请人地址： JPX Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX5-256602 19931014; JPX5-263366 19931021
- 主分类号： G01N21/94
- IPC分类号： G01N21/94 ; G01N21/86
摘要：
In a defect inspection method, inspection light is irradiated onto the surface to be inspected of an object to be inspected, a defect on the surface to be inspected is detected on the basis of a signal obtained by photoelectrically converting scattered light of the inspection light from the surface to be inspected, and the size of the detected defect is determined. When a plurality of defects are detected, the detected defects are observed at a predetermined magnification in the order from larger defects on the basis of the determination result. When a defective portion is found as a result of the observation, defect inspection of the object to be inspected is terminated.