发明授权
- 专利标题: ABS molding compounds with improved toughness
- 专利标题(中): 具有改善韧性的ABS模塑料
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申请号: US660467申请日: 1996-06-07
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公开(公告)号: US5674940A公开(公告)日: 1997-10-07
- 发明人: Herbert Eichenauer , Ulrich Jansen , Karl-Erwin Piejko
- 申请人: Herbert Eichenauer , Ulrich Jansen , Karl-Erwin Piejko
- 申请人地址: DEX Leverkusen
- 专利权人: Bayer AG
- 当前专利权人: Bayer AG
- 当前专利权人地址: DEX Leverkusen
- 优先权: DEX4414124.6 19940422
- 主分类号: C08F2/22
- IPC分类号: C08F2/22 ; C08F279/02 ; C08F279/04 ; C08L51/04 ; C08L55/02
摘要:
Thermoplastic molding compounds of the ABS type of A) at least one graft polymer obtainable by emulsion polymerization of styrene and acrylonitrile in a ratio by weight of 90:10 to 50:50, the styrene and/or acrylonitrile being completely or partly replaceable by .alpha.-methyl styrene, methyl methacrylate or N-phenyl maleic imide, in the presence of at least two butadiene polymer latices of type (A) and (B), of which each contains 0 to 50% by weight of another vinyl monomer in copolymerized form, the ratio by weight of the monomers used to the butadiene polymers used being 25:75 to 70:30, and B) at least one copolymer of styrene and acrylonitrile in a ratio by weight of 90:10 to 50:50, the styrene and/or acrylonitrile being completely or partly replaceable by .alpha.-methyl styrene, methyl methacrylate or N-phenyl maleic imide, characterized in that the butadiene polymer latex (A) has a particle diameter d.sub.50 of .ltoreq.250 nm, a width of the particle size distribution (measured as d.sub.90 -d.sub.10 from the integral particle size distribution) of 500 to 1000 nm and a gel content of .ltoreq.70% by weight, the butadiene polymer latex (B) has a particle diameter d.sub.50 of .gtoreq.300 nm, a width of the particle size distribution (measured as d.sub.90 -d.sub.10 from the integral particle size distribution) of 50 to 500 nm and a gel content of .gtoreq.70% by weight and the graft polymerization is carried out by addition of the monomers to the mixture of butadiene polymer latices (A) and (B) in such a way that 55 to 90% by weight of the monomers are added in the first half of the monomer addition time.
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