发明授权
- 专利标题： Wafer scrubbing device
- 专利标题（中）： 晶圆洗涤装置
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申请号： US665157申请日： 1996-06-14
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公开(公告)号： US5675856A公开(公告)日： 1997-10-14
- 发明人: Herman Itzkowitz
- 申请人： Herman Itzkowitz
- 申请人地址： PA Fort Washington
- 专利权人： Solid State Equipment Corp.
- 当前专利权人： Solid State Equipment Corp.
- 当前专利权人地址： PA Fort Washington
- 主分类号： B08B1/04
- IPC分类号： B08B1/04 ; B08B3/04 ; G11B23/50 ; H01L21/00 ; H01L21/304 ; B08B3/02 ; B08B11/02
摘要：
A wafer scrubbing device for cleaning the surfaces of a thin disk disposed on a stationary spin chuck employs a double brush arrangement whereby brush rotation induces rotation of the disk to be cleaned and whereby the speed differential between the constant rotational speed of the brushes and the variable rotational speed of the disk due to the relative position of the brushes on the disk causes the scrubbing of both surfaces and the edge of the disk.
公开/授权文献
- US5163580A Package of stacked roofing washers and related methods 公开/授权日：1992-11-17
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