发明授权
- 专利标题: Plasma apparatus
- 专利标题(中): 等离子体仪器
-
申请号: US621527申请日: 1996-03-25
-
公开(公告)号: US5679204A公开(公告)日: 1997-10-21
- 发明人: Masayuki Kobayashi , Kiyoshi Maeda , Masato Toyota , Hiroshi Ohnishi , Hiroshi Tanaka , Toshio Komemura , Tamio Matsumura
- 申请人: Masayuki Kobayashi , Kiyoshi Maeda , Masato Toyota , Hiroshi Ohnishi , Hiroshi Tanaka , Toshio Komemura , Tamio Matsumura
- 申请人地址: JPX Kagawa JPX Hyogo JPX Tokyo
- 专利权人: Shikoku Instrumentation Co., Ltd.,Ryoden Semiconductor System Engineering Corporation,Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Shikoku Instrumentation Co., Ltd.,Ryoden Semiconductor System Engineering Corporation,Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Kagawa JPX Hyogo JPX Tokyo
- 优先权: JPX7-244441 19950922
- 主分类号: C23F4/00
- IPC分类号: C23F4/00 ; H01J37/32 ; H01L21/302 ; H01L21/3065 ; H01L21/00
摘要:
Components such as an earth plate, a gas introduction ring, and the like placed in a reaction chamber in a plasma apparatus are made of aluminum containing magnesium in a concentration of 2.2 to 2.8% by weight and are not coated with alumite. In addition, a heater incorporated in a section of the reaction chamber heats the section during a plasma cleaning process. Further, an electrical discharge chamber is also incorporated in the plasma apparatus for providing a plasma to the reaction chamber for efficient plasma cleaning of the apparatus.
公开/授权文献
- US3965134A Process for making silarylenesilanediol 公开/授权日:1976-06-22