发明授权
- 专利标题: Polysiloxane compounds and positive resist compositions
- 专利标题(中): 聚硅氧烷化合物和正性抗蚀剂组合物
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申请号: US719011申请日: 1996-09-24
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公开(公告)号: US5691396A公开(公告)日: 1997-11-25
- 发明人: Katsuya Takemura , Junji Tsuchiya , Osamu Watanabe , Toshinobu Ishihara
- 申请人: Katsuya Takemura , Junji Tsuchiya , Osamu Watanabe , Toshinobu Ishihara
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-270580 19950925
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; C08G77/14 ; C08G77/22 ; C08G77/38 ; C09D5/25 ; C09D183/06 ; G03F7/029 ; G03F7/039 ; G03F7/075 ; G03F7/30 ; H01L21/027 ; C08J3/28
摘要:
The invention provides a novel polysiloxane compound, typically polyhydroxybenzylsilsesquioxane, having some hydroxyl groups replaced by acetal groups and optionally acid labile groups. The polysiloxane compound is useful as an alkali soluble polymer for positive resist material.
公开/授权文献
- US5459184A Moisture-actuated hot melt adhesive 公开/授权日:1995-10-17