发明授权
- 专利标题： Mask having a pattern for detecting illuminance nonuniformity
- 专利标题（中）： 掩模具有用于检测照度不均匀性的图案
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申请号： US647705申请日： 1996-05-14
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公开(公告)号： US5709970A公开(公告)日： 1998-01-20
- 发明人: Shuichi Hashimoto
- 申请人： Shuichi Hashimoto
- 申请人地址： JPX
- 专利权人： NEC Corporation
- 当前专利权人： NEC Corporation
- 当前专利权人地址： JPX
- 优先权： JPX7-139893 19950515
- 主分类号： G03F1/44
- IPC分类号： G03F1/44 ; G03F7/20 ; H01L21/027 ; G03F9/00
摘要：
There is provided a mask used in a scan-exposing method of scanning a photosensitive substrate and a mask having a pattern formed therein in relation to a slit-shaped illuminated region, so that the photosensitive substrate is exposed to the pattern having an area larger than that of the slit-shaped illuminated region. The mask has an illuminance nonuniformity detecting pattern formed at an edge region of the mask along a scanning direction, beside a main pattern region of the mask.
公开/授权文献
- US5052690A Golf putter with alignment means 公开/授权日：1991-10-01
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