发明授权
- 专利标题: Interferometric measuring device forming a spacial interference pattern
- 专利标题(中): 形成空间干涉图案的干涉测量装置
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申请号: US432118申请日: 1995-05-05
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公开(公告)号: US5710629A公开(公告)日: 1998-01-20
- 发明人: Antoine Kevorkian , Isabelle Duport-Schanen , Pierre Benech
- 申请人: Antoine Kevorkian , Isabelle Duport-Schanen , Pierre Benech
- 申请人地址: FRX
- 专利权人: Schneider Electric S.A.
- 当前专利权人: Schneider Electric S.A.
- 当前专利权人地址: FRX
- 优先权: FRX9215002 19921210
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G02B6/12 ; G02B6/122
摘要:
Two input beams (10, 20) of the interferometric measuring device, achieved according to the integrated optics technology, are broadened so as to form two spread flat beams creating an interference pattern (30). Two detectors (14, 15) supply two measuring signals, preferably in phase quadrature, representative of two points of the interference plane.
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