发明授权
US5723019A Drip chemical delivery method and apparatus 失效
滴剂化学输送方法和装置

Drip chemical delivery method and apparatus
摘要:
A drip chemical delivery system used in semiconductor substrate cleaning processes. A drip chemical delivery system which uses small openings in a pipe (holes) and a low air pressure to saturate the brushes in a double sided brush system. This drip delivery system reduces the volumes of chemical solutions used in a scrubbing process and helps to maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a double sided scrubber.
信息查询
0/0