发明授权
US5736429A Method of forming a layer of silica to be eliminated subsequently and method for mounting an integrated optical component 失效
随后形成待消除的二氧化硅层的方法和用于安装集成的光学部件的方法

Method of forming a layer of silica to be eliminated subsequently and
method for mounting an integrated optical component
摘要:
In a method for mounting an integrated optical component, a starting base structure includes a silica lower confinement layer and the cores of the future optical waveguides. This basic structure includes an alignment abutment so that a component to be mounted can be subsequently aligned with these waveguides. A silicon barrier layer is deposited on the abutment. Flame hydrolysis deposition is then used to deposit an upper silica layer to constitute the upper confinement layer of the waveguides. This silica layer also covers the alignment abutment, however. For this reason the region of the abutment is then etched by reactive ion etching to expose the abutment, which is protected from this etching by the barrier layer. The component to be mounted is then located relative to the abutment.
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