- 专利标题: Printing apparatus and method of making mask pattern for exposure thereby
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申请号: US786316申请日: 1997-01-22
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公开(公告)号: US5741079A公开(公告)日: 1998-04-21
- 发明人: Hitoshi Hayama , Yoshiyuki Yanagisawa , Kenji Watanabe , Takanobu Kameda , Tomoyuki Shimmura
- 申请人: Hitoshi Hayama , Yoshiyuki Yanagisawa , Kenji Watanabe , Takanobu Kameda , Tomoyuki Shimmura
- 申请人地址: JPX Tokyo JPX Tokyo
- 专利权人: Seiko Epson Corporation,King Jim Co., Ltd.
- 当前专利权人: Seiko Epson Corporation,King Jim Co., Ltd.
- 当前专利权人地址: JPX Tokyo JPX Tokyo
- 优先权: JPX8-009269 19960123; JPX8-253947 19960904
- 主分类号: B41C1/04
- IPC分类号: B41C1/04 ; B41J2/365 ; B41J33/36
摘要:
There are provided a printing apparatus and a method of making a mask pattern for exposure by the use of the printing apparatus. A temperature of a thermal head is detected, and a plurality of split pulses formed by dividing a strobe pulse applied to the thermal head are sequentially applied with quiescent periods interposed therebetween. There is stored in advance pulse-applying data of settings of a cumulative period of pulse-applying periods over which the plurality of split pulses are respectively applied, a number of the split pulses, the split pulse-applying periods, and the quiescent periods, defined in a manner corresponding to values of the temperature of the thermal head. Appropriate pulse-applying data is read out according to the temperature detected, and application of the split pulses is controlled according to the appropriate pulse-applying data. In another form, the split pulses are controlled in a manner such that the cumulative period of the split pulse-applying periods is sufficient for a time period over which the strobe pulse is required to be applied.
公开/授权文献
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