发明授权
- 专利标题: Method of growing gallium nitride on a spinel substrate
- 专利标题(中): 在尖晶石衬底上生长氮化镓的方法
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申请号: US774819申请日: 1996-12-27
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公开(公告)号: US5741724A公开(公告)日: 1998-04-21
- 发明人: Jamal Ramdani , Michael S. Lebby , Paige M. Holm
- 申请人: Jamal Ramdani , Michael S. Lebby , Paige M. Holm
- 申请人地址: IL Schaumburg
- 专利权人: Motorola
- 当前专利权人: Motorola
- 当前专利权人地址: IL Schaumburg
- 主分类号: C30B29/38
- IPC分类号: C30B29/38 ; H01L21/20 ; H01L21/203 ; H01L21/205 ; H01L33/00
摘要:
A method of growing gallium nitride on a spinel substrate by providing a supporting substrate having a surface, and disposing a plurality of buffer layers on the surface of the supporting substrate. The plurality of buffer layers including a first buffer layer of aluminum oxynitride having a low percentage of mismatch to the spinel substrate. The second buffer layer is disposed on the first buffer layer and includes a plurality of layers of a graded aluminum oxynitride having a low dislocation density. A third buffer layer of aluminum nitride is disposed on the second buffer layer. A fourth buffer layer of gallium nitride is disposed on the third buffer layer. Subsequently, a photonic device structure, such as a laser, LED or detector, an electronic device structure, such as a field effect transistor or modulation doped field effect transistor, or an optical waveguide is fabricated on the fourth buffer layer.
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