发明授权
US5744198A Method of depositing metal sulfide films from metal thiocarboxylate complexes with multidentate ligands 失效
从金属硫代羧酸盐络合物与多齿配体沉积金属硫化物膜的方法

Method of depositing metal sulfide films from metal thiocarboxylate
complexes with multidentate ligands
摘要:
In a method of depositing a metal sulfide film on a substrate, at least one metal compound precursor comprising at least one thiocarboxylate ligand SECR and at least one solubility-improving ligand L is dissolved in a solvent to produce a solution, wherein a) E is selected from the group consisting of O and S and R is selected from the group consisting of alkyl, aryl, substituted alkyl, substituted aryl, halogenated alkyl, and halogenated aryl; and wherein b) L is selected from the group of monodentate ligands, multidentate ligands, and R.sup.1 O ligands. The solution is coated onto a substrate and the substrate is heated to a reaction temperature sufficient to decompose the metal compound precursor to form a metal sulfide film of at least one metal on the substrate.
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