发明授权
- 专利标题: Near-ultra-violet formation of refractive-index grating using reflective phase mask
- 专利标题(中): 使用反射相位掩模的近紫外形成折射光栅
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申请号: US775461申请日: 1996-12-30
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公开(公告)号: US5745617A公开(公告)日: 1998-04-28
- 发明人: Dmitry S. Starodubov , Jack L. Feinberg
- 申请人: Dmitry S. Starodubov , Jack L. Feinberg
- 申请人地址: CA Los Angeles
- 专利权人: D-STAR Technologies, LLC
- 当前专利权人: D-STAR Technologies, LLC
- 当前专利权人地址: CA Los Angeles
- 主分类号: G02B6/00
- IPC分类号: G02B6/00 ; G02B6/34
摘要:
A grating is induced in the core of a hydrogen-loaded high-germanium-content optical fiber using near-UV (275 nm-390 nm) laser light. An interference pattern is generated at the core using a molded polymer phase mask with a square wave surface relief pattern. The light is directed through the phase mask, through a protective fiber coating, through the cladding, and into the core. The phase mask generates an interference pattern with a period half that of the surface relief pattern. Index of refraction changes occur at the bright fringes of the interference pattern--thus creating the grating. Advantages over existing mid-UV technology include lower fabrication costs for phase masks, simplified grating induction since fiber coatings do not need to be removed, and reduced infrared absorption caused by grating formation in the fiber.