发明授权
- 专利标题: Single-poly neuron MOS transistor
- 专利标题(中): 单多晶硅神经元MOS晶体管
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申请号: US684410申请日: 1996-07-19
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公开(公告)号: US5753954A公开(公告)日: 1998-05-19
- 发明人: Min-hwa Chi , Albert Bergemont
- 申请人: Min-hwa Chi , Albert Bergemont
- 申请人地址: CA Santa Clara
- 专利权人: National Semiconductor Corporation
- 当前专利权人: National Semiconductor Corporation
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L27/115 ; H01L29/788
摘要:
A single-poly neuron transistor is formed by utilizing a series of doped substrate regions in lieu of the input gates that are conventionally used to form neuron transistors. With conventional neuron transistors, the input gates are isolated from the floating gate by a layer of interpoly dielectric. In the present invention, the series of doped substrate regions are isolated from the floating gate by a layer of gate oxide.
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