- 专利标题: Resist processing method and apparatus
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申请号: US639748申请日: 1996-04-29
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公开(公告)号: US5759614A公开(公告)日: 1998-06-02
- 发明人: Takayuki Tomoeda , Masaaki Murakami , Kenichi Nishioka
- 申请人: Takayuki Tomoeda , Masaaki Murakami , Kenichi Nishioka
- 申请人地址: JPX Tokyo JPX Tosu
- 专利权人: Tokyo Electron Limited,Tokyo Electron Kyushu Limited
- 当前专利权人: Tokyo Electron Limited,Tokyo Electron Kyushu Limited
- 当前专利权人地址: JPX Tokyo JPX Tosu
- 优先权: JPX6-064345 19940309; JPX6-084064 19940330
- 主分类号: G03F7/16
- IPC分类号: G03F7/16 ; G03F7/30 ; B65D3/12
摘要:
The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.
公开/授权文献
- USPP5702P Hybrid miniature rose plant cv. Arogobi 公开/授权日:1986-04-01