Invention Grant
- Patent Title: Photoresist stripping and cleaning compositions
- Patent Title (中): 光阻剥离和清洁组合物
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Application No.: US709052Application Date: 1996-09-06
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Publication No.: US5759973APublication Date: 1998-06-02
- Inventor: Kenji Honda , Taishih Maw , Donald F. Perry
- Applicant: Kenji Honda , Taishih Maw , Donald F. Perry
- Applicant Address: CT Norwalk
- Assignee: Olin Microelectronic Chemicals, Inc.
- Current Assignee: Olin Microelectronic Chemicals, Inc.
- Current Assignee Address: CT Norwalk
- Main IPC: G03F7/34
- IPC: G03F7/34 ; G03F7/42 ; C11D7/12 ; C11D7/26 ; C11D7/50
Abstract:
A stripping and cleaning composition comprising water, at least one amine compound, and at least one corrosion inhibitor selected from (a) quaternary ammonium silicate and (b) a catechol nucleus-containing oligomer having a molecular weight of about 220 to about 5,000, and optionally a polar organic solvent.
Public/Granted literature
- US4610457A Vehicle swivel hitch Public/Granted day:1986-09-09
Information query
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