发明授权
US5761023A Substrate support with pressure zones having reduced contact area and
temperature feedback
失效
具有减小的接触面积和温度反馈的压力区的基板支撑
- 专利标题: Substrate support with pressure zones having reduced contact area and temperature feedback
- 专利标题(中): 具有减小的接触面积和温度反馈的压力区的基板支撑
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申请号: US641147申请日: 1996-04-25
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公开(公告)号: US5761023A公开(公告)日: 1998-06-02
- 发明人: Brian Lue , Tetsuya Ishikawa , Fred C. Redeker , Manus Wong , Shijian Li
- 申请人: Brian Lue , Tetsuya Ishikawa , Fred C. Redeker , Manus Wong , Shijian Li
- 申请人地址: CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/302
- IPC分类号: H01L21/302 ; G03F7/20 ; H01L21/205 ; H01L21/3065 ; H01L21/683 ; H02N13/00
摘要:
An improved substrate support and method for operating in which multiple pressure zones are provided on the surface of the substrate support. A seal area is provided between the different zones to allow different gas pressures in the two zones. A higher gas pressure is provided to a zone corresponding to an area of the substrate where greater heat transfer is desired. The gap between the substrate support and the gas pressure are selected to provide the desired amount of heat transfer. Another aspect is limited substrate contact using protrusions, to maximize heat transfer gas flow. A closed loop control system varies the heat transfer gas pressure in accordance with a temperature sensor. For an electrostatic chuck, the dielectric thickness is varied to give a higher electrostatic force at the periphery of the substrate.
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