Invention Grant
- Patent Title: Laser interferometric lithographic system providing automatic change of fringe spacing
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Application No.: US721460Application Date: 1996-09-27
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Publication No.: US5771098APublication Date: 1998-06-23
- Inventor: Amalkumar P. Ghosh , Susan K. Schwartz Jones , Gary W. Jones , Steven M. Zimmerman , Yachin Liu
- Applicant: Amalkumar P. Ghosh , Susan K. Schwartz Jones , Gary W. Jones , Steven M. Zimmerman , Yachin Liu
- Applicant Address: NY Hopewell Junction
- Assignee: Fed Corporation
- Current Assignee: Fed Corporation
- Current Assignee Address: NY Hopewell Junction
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G03F7/00 ; G03F7/20
Abstract:
An interferometric lithographic apparatus includes an arrangement for applying interfering laser beams to a part for producing a first interference pattern. The first interference pattern has a first fringe spacing. A mobile part holder stage is repositioned to change the interference pattern and produce a second fringe spacing. A control arrangement, automatically responsive to the repositioning of the part holder, re-aligns optical paths and optimally interferes the laser beams to produce the second fringe spacing.
Public/Granted literature
- US5240221A Viscoelastic damping system Public/Granted day:1993-08-31
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