发明授权
US5782978A Coating device with movable fluid supply nozzle and rotatable substrate
holder
失效
涂层装置带有可移动的液体供应喷嘴和可旋转的基板支架
- 专利标题： Coating device with movable fluid supply nozzle and rotatable substrate holder
- 专利标题（中）： 涂层装置带有可移动的液体供应喷嘴和可旋转的基板支架
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申请号： US876866申请日： 1997-06-16
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公开(公告)号： US5782978A公开(公告)日： 1998-07-21
- 发明人: Kazuo Kinose , Takeshi Yonezawa , Taimi Oketani , Tomoo Yamamoto
- 申请人： Kazuo Kinose , Takeshi Yonezawa , Taimi Oketani , Tomoo Yamamoto
- 申请人地址： JPX Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JPX Osaka
- 优先权： JPX6-077653 19940415
- 主分类号： B05C11/08
- IPC分类号： B05C11/08 ; B05D1/00 ; B05D1/40 ; G03F7/16 ; H01L21/00 ; H01L21/027 ; B05C5/00
摘要：
A fluid application apparatus of the present invention includes a rotatable substrate holding mechanism (4), a photoresist liquid supply portion (5) and a motor mechanism (26). The photoresist liquid supply portion (5) supplies resist fluid to a region smaller than the entire region of the substrate surface while moving in the horizontal direction relative to the substrate holding mechanism (4). The motor mechanism (26) rotates the substrate holding mechanism (4) to diffuse the resist fluid over the entire surface of the substrate and form a resist layer having a predetermined thickness.