发明授权
- 专利标题： Image forming system and process cartridge having particular arrangement of electrical contacts
- 专利标题（中）： 图像形成系统和处理盒具有电触点的特定布置
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申请号： US837127申请日： 1997-04-14
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公开(公告)号： US5828929A公开(公告)日： 1998-10-27
- 发明人: Kazushi Watanabe , Kazumi Sekine , Tadayuki Tsuda , Isao Ikemoto , Yoshimasu Yamaguchi , Yoshikazu Sasago , Shinya Noda , Kazunori Kobayashi
- 申请人： Kazushi Watanabe , Kazumi Sekine , Tadayuki Tsuda , Isao Ikemoto , Yoshimasu Yamaguchi , Yoshikazu Sasago , Shinya Noda , Kazunori Kobayashi
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-194663 19920630
- 主分类号： G03G15/02
- IPC分类号： G03G15/02 ; G03G15/00 ; G03G15/06 ; G03G21/18 ; G03G21/00
摘要：
A process cartridge is mountable to an image forming system and includes an image bearing member; a developing bias contact for applying a developing bias to a developing device; an earthing contact for earthing the image bearing member; and a charging bias contact for applying a charging bias to a charging device. The developing bias contact, the earthing contact, and the charging bias contact are arranged in an area corresponding to an end portion of the image bearing member in a longitudinal direction of the image bearing member, such that (i) the developing bias contact is arranged at a first side of the image bearing member in a direction orthogonal to the longitudinal direction of the image bearing member, and (ii) the earthing contact and the charging bias contact are arranged at a second side of the image bearing member in the orthogonal direction.
公开/授权文献
- US4757208A Masked ion beam lithography system and method 公开/授权日：1988-07-12
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