发明授权
- 专利标题: Coating solution applying method and apparatus
- 专利标题(中): 涂布溶液施用方法和装置
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申请号: US662216申请日: 1996-06-11
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公开(公告)号: US5843527A公开(公告)日: 1998-12-01
- 发明人: Masakazu Sanada
- 申请人: Masakazu Sanada
- 申请人地址: JPX
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX7-174127 19950615; JPX7-276373 19950928; JPX7-276375 19950928; JPX8-035563 19960129; JPX8-035565 19960129; JPX8-065502 19960226
- 主分类号: B05C11/08
- IPC分类号: B05C11/08 ; B05D1/00 ; G03F7/16 ; B05D3/12
摘要:
A method of applying a coating solution to spinning substrates, in which a controller causes a rotary support to spin a substrate at low speed with a predetermined supplying rotational frequency. The coating solution is supplied through a coating solution supply nozzle to a region centrally of the substrate spinning at low speed. The rotational frequency of the substrate is increased to a target rotational frequency before the coating solution supplied to the substrate spreads over an entire surface of the substrate. Then, the controller causes the rotary support to spin the substrate at high speed with a predetermined film-forming rotational frequency, thereby coating the surface of the substrate with a film of desired thickness. Also, an apparatus for performing such method.
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