发明授权
- 专利标题： Polymers and chemically amplified positive resist compositions
- 专利标题（中）： 聚合物和化学增幅阳性抗蚀剂组合物
-
申请号： US630633申请日： 1996-04-11
-
公开(公告)号： US5844057A公开(公告)日： 1998-12-01
- 发明人: Osamu Watanabe , Yoshihumi Takeda , Junji Tsuchiya , Toshinobu Ishihara
- 申请人： Osamu Watanabe , Yoshihumi Takeda , Junji Tsuchiya , Toshinobu Ishihara
- 申请人地址： JPX
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JPX
- 优先权： JPX7-111189 19950412
- 主分类号： C08F212/14
- IPC分类号： C08F212/14 ; G03C1/492 ; C08F12/24
摘要：
The invention provides a novel polymer comprising a recurring unit of formula. (1) wherein R.sup.1 is hydrogen or methyl, R.sup.2 is hydrogen or acid labile group, at least one R.sup.2 being hydrogen and at least one R.sup.2 being an acid labile group, and n=2 or 3. The polymer's Mw is 3,000-300,000. Blending the polymer as a base resin with an organic solvent and a photoacid generator yields a chemically amplified positive resist composition. ##STR1##
公开/授权文献
信息查询
IPC分类:
