发明授权
- 专利标题： Method for producing a photomask
- 专利标题（中）： 光掩模的制造方法
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申请号： US871977申请日： 1997-06-10
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公开(公告)号： US5851702A公开(公告)日： 1998-12-22
- 发明人: Kunio Watanabe , Shinji Kobayashi , Masashi Inoue
- 申请人： Kunio Watanabe , Shinji Kobayashi , Masashi Inoue
- 申请人地址： JPX Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JPX Osaka
- 优先权： JPX8-226382 19960828
- 主分类号： G03F1/68
- IPC分类号： G03F1/68 ; G03F1/80 ; H01L21/027 ; H01L21/302 ; H01L21/3065 ; G03F9/00
摘要：
A method for producing a photomask of the present invention includes the steps of: forming a light-blocking film on a surface of a transparent substrate; forming a resist film for an EB on the light-blocking film; patterning the resist film by EB writing and development; and selectively etching the light-blocking film using the patterned resist film to form a photomask, wherein the light-blocking film has a thickness in the range of about 60 nm to about 70 nm.
公开/授权文献
- US4166674A Objective lens system for microscopes 公开/授权日：1979-09-04
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