发明授权
- 专利标题: Method for porifying fine particulate silica
- 专利标题(中): 细颗粒二氧化硅的细化方法
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申请号: US848271申请日: 1997-04-29
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公开(公告)号: US5855860A公开(公告)日: 1999-01-05
- 发明人: Masanobu Nishimine , Yoshio Tomizawa , Hidekazu Uehara , Kiyoshi Shirasuna , Susumu Ueno
- 申请人: Masanobu Nishimine , Yoshio Tomizawa , Hidekazu Uehara , Kiyoshi Shirasuna , Susumu Ueno
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX6-288998 19941027
- 主分类号: C01B33/18
- IPC分类号: C01B33/18 ; C01B33/12
摘要:
Crude fumed silica resulting from pyrogenic hydrolysis is purified by continuously feeding particulate silica and steam or a mixture of steam and air in a steam/air volume ratio of at least 1/2 through an upright column from its bottom toward its top for forming a fluidized bed within the column at a gas linear velocity of 1 to 10 cm/sec. and a temperature of 250.degree. to 400.degree. C., whereby steam deprives the particulate silica of the halide borne thereon, and removing fine particulate silica from which the halide has been eliminated from the top of the column. Using a simple apparatus, pure fine particulate silica is collected at a low cost of energy consumption.
公开/授权文献
- US4729393A Flushing adaptor and method of manufacture 公开/授权日:1988-03-08
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