发明授权
- 专利标题: Porous ceramic film and process for producing the same
- 专利标题(中): 多孔陶瓷膜及其制造方法
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申请号: US538738申请日: 1995-10-03
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公开(公告)号: US5858523A公开(公告)日: 1999-01-12
- 发明人: Chihiro Kawai , Takahiro Matsuura , Akira Yamakawa
- 申请人: Chihiro Kawai , Takahiro Matsuura , Akira Yamakawa
- 申请人地址: JPX
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX6-283448 19941117; JPX7-269138 19950922
- 主分类号: B01D71/02
- IPC分类号: B01D71/02 ; B01D39/20 ; B01J35/04 ; C04B38/00 ; C04B41/45 ; C04B41/52 ; C04B41/81 ; C04B41/85 ; C04B41/89 ; B32B29/02
摘要:
A porous ceramic film which is formed onto and bonded to an oxide layer provided on the surface of a porous base, the film composed of finely deposited particles comprising at least one compound including (a) at least one selected from the group consisting of Si, B and Al or the group consisting of the metals of the Groups IVa, Va and VIa and (b) at least one selected from the group consisting of C and N in which the particles are intertwined with each other and bonded to each other through the component of the oxide layer to form a three-dimensionally intertwined structure. This porous ceramic film is produced by forming the oxide layer on the base surface and then heating it to a temperature of at least of the liquid-phase formation temperature of the oxide layer in a gaseous atmosphere containing the above elements (a) and (b). The porous ceramic film has a high porosity, a good pressure resistance and a regulated pore size and is appropriate for a filter, a catalyst support, bioreactor or a structural material.
公开/授权文献
- US4542075A High barrier shrink film 公开/授权日:1985-09-17