发明授权
US5861229A Radiation-sensitive positive resist composition comprising a 1,2-quinone
diazide compound, an alkali-soluble resin and a polyphenol compound
失效
包含1,2-醌二叠氮化合物，碱溶性树脂和多酚化合物的辐射敏感性正性抗蚀剂组合物
- 专利标题： Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
- 专利标题（中）： 包含1,2-醌二叠氮化合物，碱溶性树脂和多酚化合物的辐射敏感性正性抗蚀剂组合物
-
申请号： US948466申请日： 1992-09-22
-
公开(公告)号： US5861229A公开(公告)日： 1999-01-19
- 发明人: Haruyoshi Osaki , Fumio Oi , Yasunori Uetani , Makoto Hanabata , Takeshi Hioki
- 申请人： Haruyoshi Osaki , Fumio Oi , Yasunori Uetani , Makoto Hanabata , Takeshi Hioki
- 申请人地址： JPX Osaka
- 专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人地址： JPX Osaka
- 优先权： JPX169477/1988 19880707; JPX331074/1988 19881227
- 主分类号： G03F7/022
- IPC分类号： G03F7/022 ; G03F7/023
摘要：
A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula:X--.alpha.--H (I)wherein x is a group of the formula: ##STR1## and .alpha. is a divalent group which comprises a repeating unit of the formula: ##STR2## in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d+f is not less than 1; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or an aryl group, which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.
公开/授权文献
- US4293146A VMP Casing tieback 公开/授权日：1981-10-06