发明授权
- 专利标题: Semiconductor strain sensor
- 专利标题(中): 半导体应变传感器
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申请号: US788169申请日: 1997-01-24
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公开(公告)号: US5869876A公开(公告)日: 1999-02-09
- 发明人: Seiichiro Ishio , Kenichi Ao , Hiroshige Sugito
- 申请人: Seiichiro Ishio , Kenichi Ao , Hiroshige Sugito
- 申请人地址: JPX Kariya
- 专利权人: Denso Corporation
- 当前专利权人: Denso Corporation
- 当前专利权人地址: JPX Kariya
- 优先权: JPX8-011623 19960126
- 主分类号: G01P15/08
- IPC分类号: G01P15/08 ; G01P15/12 ; H01L29/84 ; H01L29/82 ; H01L27/20
摘要:
A semiconductor strain sensor has a gauge forming region on a p-type substrate surrounded by a p-type isolation region that reaches the p-type substrate. The p-type substrate is etched so that the entire bottom surface of the gauge forming region is covered by the p-type substrate, and the p-type substrate or p-type isolation region is not exposed to the etched recess portion or isolation groove, each of which have a relatively high number of defects. Thus, leakage current at the PN junction can be decreased to decrease a variation in the potential of the gauge forming region.
公开/授权文献
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