发明授权
- 专利标题： Method of determining the radiation dose in a lithographic apparatus
- 专利标题（中）： 确定光刻设备中辐射剂量的方法
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申请号： US800446申请日： 1997-02-18
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公开(公告)号： US5910847A公开(公告)日： 1999-06-08
- 发明人: Jan E. Van der Werf , Peter Dirksen , Manfred G. Tenner
- 申请人： Jan E. Van der Werf , Peter Dirksen , Manfred G. Tenner
- 申请人地址： NY New York
- 专利权人： U.S. Philips Corporation
- 当前专利权人： U.S. Philips Corporation
- 当前专利权人地址： NY New York
- 优先权： EPX96200378 19960215
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/207 ; G03F9/00 ; H01L21/00 ; H01L21/027 ; H01L21/68 ; G01B11/00
摘要：
A method and apparatus for forming a pattern on a substrate (w), either or not via a mask pattern (c), are described. The radiation dose can be measured accurately and reliably by measuring a latent image of a new, asymmetrical test mark (TM) by means of an optical alignment device present in the apparatus or associated therewith, this latent image being formed by means of production radiation (PB) in the radiation-sensitive layer on the substrate.
公开/授权文献
- US5196206A Vacuum heat shield 公开/授权日：1993-03-23
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