发明授权
- 专利标题: Semiconductor processing chamber having diamond coated components
- 专利标题(中): 具有金刚石涂层部件的半导体处理室
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申请号: US97226申请日: 1998-06-12
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公开(公告)号: US5916370A公开(公告)日: 1999-06-29
- 发明人: Chow Ling Chang
- 申请人: Chow Ling Chang
- 申请人地址: CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/687
- IPC分类号: H01L21/687 ; C23L16/00
摘要:
A semiconductor processing chamber having diamond coated components.
公开/授权文献
- USD421892S Gate hook 公开/授权日:2000-03-28
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