发明授权
- 专利标题: Process for preparing 3-halogenated cephem derivative
- 专利标题(中): 3-卤代头孢烯衍生物的制备方法
-
申请号: US849393申请日: 1997-06-03
-
公开(公告)号: US5919924A公开(公告)日: 1999-07-06
- 发明人: Michio Sasaoka , Shigeru Torii , Hideo Tanaka , Ryo Kikuchi , Yutaka Kameyama , Kouichi Sorajo
- 申请人: Michio Sasaoka , Shigeru Torii , Hideo Tanaka , Ryo Kikuchi , Yutaka Kameyama , Kouichi Sorajo
- 申请人地址: JPX Osaka
- 专利权人: Otsuka Kagaku Kabushiki Kaisha
- 当前专利权人: Otsuka Kagaku Kabushiki Kaisha
- 当前专利权人地址: JPX Osaka
- 优先权: JPX7-317255 19951110
- 主分类号: A61K31/545
- IPC分类号: A61K31/545 ; A61K31/546 ; A61P31/04 ; B01J27/055 ; B01J27/122 ; B01J31/20 ; C07B61/00 ; C07D501/00 ; C07D501/08 ; C07D501/18 ; C07D501/59
摘要:
A process for preparing a 3-halogenated cephem derivative represented by the formula (2), characterized by causing a halogenating reagent to act on an allenyl .beta.-lactam compound represented by the formula (1) in the presence of a cuprous salt or cupric salt to obtain the 3-halogenated cephem derivative ##STR1## wherein R.sup.1 is a hydrogen atom, amino or protected amino, R.sup.2 is a hydrogen atom, halogen atom, lower alkoxyl, lower acyl, lower alkyl, lower alkyl having at least one selected from hydroxyl and protected hydroxyl as a substituent, hydroxyl or protected hydroxyl, R.sup.3 is a hydrogen atom or carboxylic acid protecting group, R.sup.4 is an aromatic compound residue which may have a substituent or nitrogen-containing aromatic heterocyclic compound residue which may have a substituent, and n is 0 to 2 ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, X is a halogen atom.
信息查询
IPC分类: