发明授权
- 专利标题: Process for obtaining a lift-off imaging profile
- 专利标题(中): 获取剥离成像轮廓的过程
-
申请号: US802807申请日: 1997-02-18
-
公开(公告)号: US5922503A公开(公告)日: 1999-07-13
- 发明人: Mark A. Spak , Ralph R. Dammel , Michael Deprado
- 申请人: Mark A. Spak , Ralph R. Dammel , Michael Deprado
- 申请人地址: VGX
- 专利权人: Clariant Finance (BVI) Limited
- 当前专利权人: Clariant Finance (BVI) Limited
- 当前专利权人地址: VGX
- 主分类号: G03F7/022
- IPC分类号: G03F7/022 ; G03F7/039 ; G03F7/09 ; G03F7/26 ; G03F7/38 ; G03F7/40 ; G11B7/24 ; G03C1/492 ; G03C5/00
摘要:
A process for obtaining a lift-off imaging profile which comprises the steps of:a) providing a first layer of plasma etchable material wherein said material has a film thickness less than about 0.5 .mu.m (micrometer);b) providing a second layer comprising a photoimageable material on top of the first layer;c) forming a pattern in said second layer which comprises the steps of selectively exposing and developing the second layer;d) reacting the second layer with an organosilicon material; ande) etching the first layer isotropically in an oxygen atmosphere.
公开/授权文献
- US5214891A Wall covering assembly 公开/授权日:1993-06-01