发明授权
- 专利标题: Method of preparing a substrate surface for conformal plating
- 专利标题(中): 制备用于保形电镀的基板表面的方法
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申请号: US662165申请日: 1996-06-12
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公开(公告)号: US5922517A公开(公告)日: 1999-07-13
- 发明人: Anilkumar Chinuprasad Bhatt , Ashwinkumar C. Bhatt , Voya Rista Markovich , William Earl Wilson , Gerald Walter Jones
- 申请人: Anilkumar Chinuprasad Bhatt , Ashwinkumar C. Bhatt , Voya Rista Markovich , William Earl Wilson , Gerald Walter Jones
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: H05K3/00
- IPC分类号: H05K3/00 ; G03F7/095 ; H05K3/18 ; G03F7/00
摘要:
Bridging between electrically conductive circuit features during conformal plating is prevented by avoiding the deposition of catalytic seed material onto non-circuit areas of the substrate. Preparatory to forming electrical circuit features on a nonconductive substrate by the full additive process, extraneous seed material is either trapped between two layers of a photoimageable film, whereby it is unavailable during plating, or deposited on the surface of an aqueous photoimageable film, which is removed prior to plating. The method embodying the present invention eliminates the need for seed removal after initial plating and prior to conformal plating of a precious metal over the initial plating.
公开/授权文献
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