发明授权
- 专利标题: Hydrogen occluding alloy and electrode made of the alloy
- 专利标题(中): 吸氢合金和电极由合金制成
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申请号: US779959申请日: 1996-12-23
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公开(公告)号: US5932369A公开(公告)日: 1999-08-03
- 发明人: Norikazu Komada , Shinichiro Kakehashi , Mitsugu Matsumoto , Yoshitaka Tamo
- 申请人: Norikazu Komada , Shinichiro Kakehashi , Mitsugu Matsumoto , Yoshitaka Tamo
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Materials Corporation
- 当前专利权人: Mitsubishi Materials Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX8-105092 19960425; JPX8-105096 19960425
- 主分类号: H01M4/38
- IPC分类号: H01M4/38
摘要:
This invention provides a hydrogen occluding alloy exhibiting high absorption/desorption rates, and excellent initial activation, the alloy having a composition comprising, by wt %, 25% to 45% of Zr, 1% to 12% of Ti, 10% to 20 % of Mn, 2% to 12% of V, 0.5% to 5% of at least one rare earth element, preferably comprising La and/or Ce, optionally 0.1% to 4% of Hf, and a balance being Ni (25% or more of Ni) and unavoidable impurities. The alloy has a structure comprising: a main phase made of a Zr--Ni--Mn based alloy, numerous cracks, and a regenerated phase made of rare earth element-Ni type alloy, the regenerated phase being exposed on the surfaces of the cracks, as well as electrodes made of the alloy.
公开/授权文献
- US5261022A Optical waveguide of silica glass film on ceramic substrate 公开/授权日:1993-11-09
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