发明授权
- 专利标题： Photolithographically patterned spring contact and apparatus and methods for electrically contacting devices
- 专利标题（中）： 光刻图案弹簧接触件和用于电接触器件的装置和方法
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申请号： US990508申请日： 1997-12-15
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公开(公告)号： US5944537A公开(公告)日： 1999-08-31
- 发明人: Donald L. Smith , Robert L. Thornton , Christopher L. Chua , David K. Fork
- 申请人： Donald L. Smith , Robert L. Thornton , Christopher L. Chua , David K. Fork
- 申请人地址： CT Stamford
- 专利权人： Xerox Corporation
- 当前专利权人： Xerox Corporation
- 当前专利权人地址： CT Stamford
- 主分类号： H01L21/56
- IPC分类号： H01L21/56 ; H01L23/48 ; H01L23/498 ; H01R4/48 ; H05K3/40 ; H01R9/03 ; H05K1/14
摘要：
A photolithographically patterned spring contact is formed on a substrate and electrically connects contact pads on two devices. The spring contact also compensates for thermal and mechanical variations and other environmental factors. An inherent stress gradient in the spring contact causes a free portion of the spring contact to bend up and away from the substrate. An anchor portion remains fixed to the substrate and is electrically connected to a first contact pad on the substrate. The spring contact is made of an elastic material and the free portion compliantly contacts a second contact pad, thereby electrically interconnecting the two contact pads.
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