发明授权
US5946433A Method for producing a photocoupler and a photocoupler produced by the
same
失效
光电耦合器的制造方法及其制造的光电耦合器
- 专利标题: Method for producing a photocoupler and a photocoupler produced by the same
- 专利标题(中): 光电耦合器的制造方法及其制造的光电耦合器
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申请号: US974476申请日: 1997-11-20
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公开(公告)号: US5946433A公开(公告)日: 1999-08-31
- 发明人: Hiroyuki Yamamoto , Yoshio Yoshida
- 申请人: Hiroyuki Yamamoto , Yoshio Yoshida
- 申请人地址: JPX Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JPX Osaka
- 优先权: JPX8-315774 19961127
- 主分类号: G02B6/122
- IPC分类号: G02B6/122 ; G02B6/34
摘要:
A method for producing a photocoupler includes the steps of: forming a waveguide structure on a substrate; forming a photoresist layer having a groove on the waveguide structure; mounting a prism on the photoresist layer so as to partially cover the groove; bonding the prism on the waveguide structure by injecting an adhesive into the groove; and removing the photoresist layer. The groove has a T-shaped pattern including a transverse section extending in a first direction and a longitudinal section extending in a second direction perpendicular to the first direction. The transverse section has a first width in the second direction which is smaller than a second length of a bonding face of the prism in the second direction. The prism is bonded to the waveguide structure through the bonding face. The longitudinal section has a second width in the first direction which is smaller than a first length of the bonding face of the prism in the first direction. The transverse section has a first length in the first direction which is greater than the first length of the bonding face of the prism in the first direction. The longitudinal section has a second length in the second direction which is greater than the second length of the bonding face of the prism in the second direction. The adhesive is injected into an end portion of the longitudinal section which is distanced away from the transverse section, the end portion not being covered by the prism.
公开/授权文献
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