发明授权
- 专利标题： Process for producing 2,6-dimethylnaphthalene
- 专利标题（中）： 生产2,6-二甲基萘的方法
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申请号： US777078申请日： 1996-12-30
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公开(公告)号： US5948949A公开(公告)日： 1999-09-07
- 发明人: Makoto Takagawa , Ryusuke Shigematsu , Kuniaki Ageishi , Ko Kedo
- 申请人： Makoto Takagawa , Ryusuke Shigematsu , Kuniaki Ageishi , Ko Kedo
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX8-041232 19960228; JPX8-059739 19960315; JPX8-059741 19960315; JPX8-091522 19960412; JPX8-091523 19960412
- 主分类号： C07C7/14
- IPC分类号： C07C7/14 ; C07C15/24 ; C07C51/265 ; C07C5/22
摘要：
A process for producing highly pure 2,6-dimethylnaphthalene in a high yield from a mixture of dimethylnaphthalene isomers in the presence of a solvent, such as an aliphatic or alicyclic saturated hydrocarbon. Highly pure 2,6-dimethylnaphthalene can be produced steadily for a long time by filtering the 2,6-dimethylnaphthalene crystal precipitated by the crystallizing by using a filtration apparatus, such as a rotary vacuum filter, peeling-off the filtered cake from a filter cloth and cleaning the filter cloth with a solvent, at a temperature not lower than a filtration temperature.
公开/授权文献
- US5228918A System for marking a continuous substrate 公开/授权日：1993-07-20