发明授权
- 专利标题: Process for producing thiourea dioxide
- 专利标题(中): 二氧化硫脲生产工艺
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申请号: US15627申请日: 1998-01-29
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公开(公告)号: US5958184A公开(公告)日: 1999-09-28
- 发明人: Toshiaki Kanada , Seikyu Jinnouchi , Masafumi Shimpo , Tetsuo Koshitsuka , Akiko Kimura
- 申请人: Toshiaki Kanada , Seikyu Jinnouchi , Masafumi Shimpo , Tetsuo Koshitsuka , Akiko Kimura
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Gas Chemical Company Inc.
- 当前专利权人: Mitsubishi Gas Chemical Company Inc.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX4-150773 19920610; JPX5-099498 19930426
- 主分类号: D21C9/10
- IPC分类号: D21C9/10 ; D21C9/16
摘要:
A process for producing a thiourea dioxide fluid by mixing thiourea and a peroxide, or thiourea, a peroxide and a reaction catalyst, or thiourea, a peroxide, a reaction catalyst and a chelating agent, in the absence or presence of pulp and a process for bleaching pulp by the use of the thiourea dioxide fluid produced by the above process economically advantageously with a small chemicals loss and by small consumption of energy.
公开/授权文献
- US5446529A 3D imaging underwater laser radar 公开/授权日:1995-08-29
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