Invention Grant
US5959488A Dual-node capacitor coupled MOSFET for improving ESD performance
失效
双节点电容耦合MOSFET,用于提高ESD性能
- Patent Title: Dual-node capacitor coupled MOSFET for improving ESD performance
- Patent Title (中): 双节点电容耦合MOSFET,用于提高ESD性能
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Application No.: US12928Application Date: 1998-01-24
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Publication No.: US5959488APublication Date: 1999-09-28
- Inventor: Shi-Tron Lin , Shyh-Chyi Wong
- Applicant: Shi-Tron Lin , Shyh-Chyi Wong
- Applicant Address: TWX
- Assignee: Winbond Electronics Corp.
- Current Assignee: Winbond Electronics Corp.
- Current Assignee Address: TWX
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H03K5/08
Abstract:
A dual-node capacitor coupling technique is used to lower the trigger voltage and to improve the uniform turn-on of a multi-finger MOSFET transistor. Preferably, each MOSFET is an NMOS device. Specifically, each NMOS device includes a capacitor that is connected between the gate of the NMOS device and the pad terminal. A first resistor is connected between the gate and the p-well, while a second resistor is connected between the p-well and the grounded source. For a positive ESD pulse to VSS, the p-well is pulled up to approximately 0.7 V during the initial ESD event, such that the source junction is forward biased and that the trigger voltage of the NMOS device is lowered. At the same time, the gate voltage is coupled within the range of approximately 1 to 2 V to promote the uniform turn on of the gate fingers of the NMOS devices during the initial ESD event.
Public/Granted literature
- USD352710S Cordless telephone Public/Granted day:1994-11-22
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