发明授权
- 专利标题: Method of holding substrate and substrate holding system
- 专利标题(中): 保持基板和基板保持系统的方法
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申请号: US904623申请日: 1997-08-01
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公开(公告)号: US5961774A公开(公告)日: 1999-10-05
- 发明人: Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
- 申请人: Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX5-230187 19930916; JPX6-48286 19940318
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/68 ; H01L21/683 ; H05H1/00
摘要:
In a method of holding a substrate and a substrate holding system, the amount of foreign substances on the back surface of the substrate can be decreased and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exosed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.
公开/授权文献
- US5554907A Vehicle speed measurement apparatus 公开/授权日:1996-09-10
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