发明授权
US5962581A Silicone polymer composition, method of forming a pattern and method of
forming an insulating film
失效
硅氧烷聚合物组合物，形成图案的方法和形成绝缘膜的方法
- 专利标题： Silicone polymer composition, method of forming a pattern and method of forming an insulating film
- 专利标题（中）： 硅氧烷聚合物组合物，形成图案的方法和形成绝缘膜的方法
-
申请号： US638698申请日： 1996-04-26
-
公开(公告)号： US5962581A公开(公告)日： 1999-10-05
- 发明人: Shuzi Hayase , Yoshihiko Nakano , Rikako Kani , Mao Ito , Satoshi Mikoshiba , Takeshi Okino , Sawako Fujioka
- 申请人： Shuzi Hayase , Yoshihiko Nakano , Rikako Kani , Mao Ito , Satoshi Mikoshiba , Takeshi Okino , Sawako Fujioka
- 申请人地址： JPX Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX7-105165 19950428; JPX7-331997 19951220; JPX7-340696 19951227; JPX8-055029 19960312
- 主分类号： C08K3/36
- IPC分类号： C08K3/36 ; C08K5/00 ; C08K3/34
摘要：
A method of forming a pattern comprising the steps of forming a film of an organosilane compound comprising a polysilane having a repeating unit represented by the following general formula (1) on a substrate, irradiating an actinic radiation onto a predetermined portion of the film of the organosilane compound formed on the substrate, and removing the predetermined portion of the film irradiated by the actinic radiation by dissolving it with an aqueous alkaline developing solution. ##STR1## wherein Ar is a substituted or non-substituted aryl group.
公开/授权文献
- US5163400A Engine unit 公开/授权日：1992-11-17