发明授权
US5963730A Method for automating top-down design processing for the design of LSI
functions and LSI mask layouts
失效
自动设计LSI功能和LSI面板布局的自顶向下设计处理方法
- 专利标题: Method for automating top-down design processing for the design of LSI functions and LSI mask layouts
- 专利标题(中): 自动设计LSI功能和LSI面板布局的自顶向下设计处理方法
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申请号: US717670申请日: 1996-09-23
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公开(公告)号: US5963730A公开(公告)日: 1999-10-05
- 发明人: Masahiko Toyonaga , Michiaki Muraoka , Hirokazu Iida
- 申请人: Masahiko Toyonaga , Michiaki Muraoka , Hirokazu Iida
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX7-247241 19950926
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A netlist between functional macros is entered. Based on the netlist, an outline layout process for a functional macro is performed and physical specifications for the functional macro are determined from an outline layout produced by the outline layout process. Thereafter, a logic synthesis process is performed on the basis of the physical specifications determined. Based on the outline layout, a logic, obtained by the logic synthesis, is laid out. This makes it possible to reduce the number of times a circuit synthesis process is redone, taking into account a laying-out at an upper-stage functional design process in which no gate level is specified. For this reason, an improved LSI automatic design method is provided which is able to complete an LSI layout design, in which the LSI area and the LSI delay value are optimized, in a short period of time.
公开/授权文献
- US5219496A Non-linear optical material and non-linear optical devices 公开/授权日:1993-06-15
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