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US5976307A Method and apparatus for removing a pellicle frame from a photomask plate 失效
从光掩模板上去除防护薄膜组件框架的方法和装置

Method and apparatus for removing a pellicle frame from a photomask plate
摘要：
A method and apparatus are disclosed for removing a pellicle frame (52) from a photomask plate (50) where the pellicle frame (52) is adhered to a surface of the photomask plate (50) by an adhesive material (54). Tension is applied to the adhesive material (54) by applying force to separate the pellicle frame (52) and the photomask plate (50). A second surface of the photomask plate (50), opposite from the surface to which the pellicle frame (52) is adhered, is heated to raise the temperature of the adhesive material (54) and to raise the temperature of the photomask plate (50) greater than the temperature of the pellicle frame (52). The tension on the adhesive material (54) is then maintained until the adhesive material (54) releases the pellicle frame (52) from the photomask plate (50).
摘要（中）：

公开了一种用于从光掩模板（50）去除防护薄膜组件框架（52）的方法和装置，其中防护薄膜组件框架（52）通过粘合材料（54）粘附到光掩模板（50）的表面。 通过施加力来分离防护薄膜组件框架（52）和光掩模板（50），对粘合剂材料（54）施加张力。 光掩模板（50）的与防尘薄膜组件框架（52）所粘接的表面相对的第二表面被加热以提高粘合材料（54）的温度并提高光掩模板（50）的温度 ）大于防护薄膜框架（52）的温度。 然后保持粘合剂材料（54）上的张力，直到粘合剂材料（54）从光掩模板（50）释放防护薄膜框架（52）。

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