发明授权
- 专利标题: Apparatus for substrate holding
- 专利标题(中): 基板保持装置
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申请号: US789764申请日: 1997-01-28
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公开(公告)号: US5989342A公开(公告)日: 1999-11-23
- 发明人: Masahide Ikeda , Masami Ohtani
- 申请人: Masahide Ikeda , Masami Ohtani
- 申请人地址: JPX
- 专利权人: Dainippon Screen Mfg, Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg, Co., Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX8-014446 19960130
- 主分类号: H01L21/683
- IPC分类号: H01L21/683 ; B05C11/08 ; G03F7/20 ; H01L21/027 ; H01L21/687 ; B05C13/00
摘要:
A substrate holding apparatus holds a rotating substrate without idly rotating the substrate and keeps the substrate in proper balance while the substrate is rotated. In a revolvable holding member, a column-shaped holding part is disposed on a top surface of a column-shaped supporting part, at an eccentric position with respect to a rotation axis of the supporting part. The revolvable holding member is supported by a rotation base for free rotation, and linked to a magnet holding part which incorporates a permanent magnet. On the other hand, a ring-shaped magnet which is disposed in a processing liquid collecting cup is freely driven by an air cylinder in a vertical direction. As the ring-shaped magnet is moved upward or downward and crosses a predetermined line as viewed in a positional relationship relative to the permanent magnet, which is at a height where the permanent magnet is disposed, the direction of a magnetic line of flux of the ring-shaped magnet is reversed. As a result, the direction of the revolving force which acts upon the permanent magnet is reversed, whereby the revolvable holding member holds or releases a substrate.