发明授权
US5994425A Curable compositions containing photosensitive high performance aromatic ether polymers 失效
含有光敏高性能芳香族醚聚合物的固化组合物

Curable compositions containing photosensitive high performance aromatic
ether polymers
摘要:
Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.
信息查询
0/0