发明授权
- 专利标题: Preparation of an electron source by offset printing electrodes having thickness less than 200 nm
- 专利标题(中): 通过厚度小于200nm的胶版印刷电极制备电子源
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申请号: US561868申请日: 1995-11-22
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公开(公告)号: US05996488A公开(公告)日: 1999-12-07
- 发明人: Yoshihiro Yanagisawa , Tetsuya Kaneko
- 申请人: Yoshihiro Yanagisawa , Tetsuya Kaneko
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX6-291310 19941125
- 主分类号: H01J9/02
- IPC分类号: H01J9/02 ; B41M1/10 ; H01J1/30
摘要:
A method of producing a substrate for an electron source, the substrate including a plurality of electron emission devices each including a pair of opposing electrodes, the plurality of electron emission devices being arranged on the substrate. The method comprises the steps of preparing an intaglio plate having recessed portions corresponding to a pattern of the electrodes, the depth of the recessed portions being in the range from 4 .mu.m to 15 .mu.m, filling the recessed portions with ink, pressing a blanket against the intaglio plate so that the ink is transferred from the inside of the recessed portions onto the blanket, and bringing the blanket into contact with the substrate so that the ink is transferred from the blanket onto the substrate thereby forming the electrode pattern thereon.
公开/授权文献
- US5063075A Amide ether derivatives as low calorie fat mimetics 公开/授权日:1991-11-05
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